Optics: measuring and testing – By polarized light examination – Of surface reflection
Patent
1985-05-22
1987-09-22
Rosenberger, R. A.
Optics: measuring and testing
By polarized light examination
Of surface reflection
356138, G01J 400
Patent
active
046951628
ABSTRACT:
A film thickness measuring apparatus comprises a light source for impinging light on a measuring plate with a predetermined incident angle .theta..sub.0, where the measuring plate comprises a transparent film on top of a transparent substrate and the transparent film has a film thickness which is to be measured by the film thickness measuring apparatus, a light receiving system for receiving and detecting light which is impinged on the measuring plate and is reflected thereby, and an analyzer system responsive to an output of the light receiving system for measuring an angle .DELTA. of the phase difference between two polarized light components of the reflected light from the measuring plate and for calculating the film thickness of the transparent film from the angle .DELTA. of the phase difference. The incident angle .theta..sub.0 of the light from the light source with respect to the measuring plate is selected equal to or approximately equal to a polarizing angle .theta..sub.b of the transparent film of the measuring plate.
REFERENCES:
patent: 3880524 (1975-04-01), Dill et al.
patent: 3985447 (1976-10-01), Aspnes
patent: 4298281 (1981-11-01), Schave
patent: 4466739 (1984-08-01), Kasner et al.
IBM Journal of Research & Development, vol. 17, Nov. 1973, pp. 472-489, New York, U.S.; P.S. Hague et al.: "Design and Operation of ETA, an Automated Ellipsometer".
Journal of the Optical Society of America, vol. 52, Sep., 1962, pp. 970-977, American Institute of Physics, New York, U.S.; R. J. Archer: "Determination of properties of films on silicon by the method of ellipsometry".
Applied Optics, vol. 11, No. 11, Nov. 1972, pp. 2534-2539, American Institute of Physics, New York, U.S.; R. O. Denicola et al.: "Epitaxial Layer Thickness Measured by Far Infrared Ellipsometry".
Applied Optics, vol. 20, No. 22, Nov. 15th, 1981, pp. 3821-3822, Optical Society of America, New York, U.S. J. P. Mdy: "Immersion Ellopsometry".
Itonaga Makoto
Kayanuma Kanji
Rosenberger R. A.
Victor Company of Japan Ltd.
LandOfFree
Film thickness measuring apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Film thickness measuring apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film thickness measuring apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2055482