Film substrate, fabrication method thereof, and image...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Reexamination Certificate

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C349S150000

Reexamination Certificate

active

11043946

ABSTRACT:
In a film substrate (FB) including a film base material (1) and conductor wiring (23) that is formed on the film base material (1), the conductor wiring (23) is arranged such that the conductor wiring thickness of an external connection portion on the film substrate to which another panel or substrate is connected is thicker than the conductor wiring thickness of conductor wiring portions (bent portions) (25) at other positions.

REFERENCES:
patent: 6217987 (2001-04-01), Ono et al.
patent: 6320135 (2001-11-01), Saito
patent: 6903794 (2005-06-01), Fukuta et al.
patent: 2003/0178724 (2003-09-01), Koyanagi
patent: 05-095208 (1993-04-01), None
patent: 06-342827 (1994-12-01), None
patent: 2002-026055 (2002-01-01), None
patent: 2002-223052 (2002-08-01), None
patent: 2003-115511 (2003-04-01), None
patent: 2003-142535 (2003-05-01), None
patent: 2003-203951 (2003-07-01), None
patent: 2004-281947 (2004-10-01), None

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