Film stacks to prevent UV-induced device damage

Details Film stacks to prevent UV-induced device damage Film stacks to prevent UV-induced device damage

2011-04-19

2011-04-19

McNeil, Jennifer C (Department: 1784)

Stock material or miscellaneous articles

Composite

Of inorganic material

C428S699000, C428S702000, C359S580000, C359S586000, C359S589000

Reexamination Certificate

active

07927723

ABSTRACT:
A film stack includes an interlayer dielectric formed over one or more devices. The film stack further includes a first layer having a high extinction coefficient formed on the interlayer dielectric and a second layer having a low extinction coefficient formed on the first layer. The first and second layers prevent ultraviolet induced damage to the one or more devices while minimizing reflectivity for lithographic processes.

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