Film forming method and film forming device

Details Film forming method and film forming device Film forming method and film forming device

1990-02-28

1991-05-14

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 156646, 156657, 156662, 156345, 118730, 118620, 118 501, 20419237, 427 38, 427309, B44C 122, H01L 21306, C03C 1500, B05D 306

Patent

active

050153307

ABSTRACT:
A film forming method comprises the steps of placing a plurality of objects to be processed and supplying an etching gas in a reaction container, removing a natural oxidization originated film on an object to be processed placed in the reaction container under a heating condition by plasma etching, exhausting the etching gas after stopping supply of the etching gas so as to stop making of the plasma, and supplying a film forming gas in the reaction container without rendering the reaction container open to air so as to form a film on the objects.

REFERENCES:
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4192706 (1980-03-01), Horiike
patent: 4668337 (1987-05-01), Sekine et al.
patent: 4786352 (1988-11-01), Benzing
patent: 4795529 (1989-01-01), Kawasaki et al.
patent: 4871416 (1989-10-01), Fukuda
patent: 4882299 (1989-11-01), Freeman et al.

Affiliated with

Also associated with

Rating

Film forming method and film forming device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film forming method and film forming device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film forming method and film forming device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1646073