Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-04-22
1998-11-17
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118715, 20429811, C23C 1600, C23C 1424, C23C 1434
Patent
active
058370579
ABSTRACT:
A film-forming apparatus is provided with a particle prevention means, whose structure prevents a drop in film-yield due to particle formation. The particle prevention means does not need to be cleaned as frequently as known particle prevention means, thus increasing film production efficiency. This particle prevention means has a tongued-and-grooved surface. When the particle prevention means having a tongued-and-grooved surface is set in the film-forming apparatus, the film-forming material is deposited in a discontinuous manner on the particle prevention means, which can extend the time of film exfoliation, and in turn, extend the cycle for cleaning the particle prevention means, and prevent a drop in film-yield due to the film exfoliation.
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Kawajiri Yukio
Koyama Shuji
Shibata Makoto
Sueoka Manabu
Suzuki Takumi
Breneman R. Bruce
Canon Kabushiki Kaisha
Lund Jeffrie R
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