Film forming apparatus and film forming method

Details Film forming apparatus and film forming method Film forming apparatus and film forming method

2005-04-05

2005-04-05

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S058000, C118S663000, C118S665000, C118S692000, C118S712000, C118S725000

Reexamination Certificate

active

06875283

ABSTRACT:
Coating an insulating film on a substrate, heating the substrate at a pressure higher than an atmospheric pressure in a chamber, followed by the curing process performed at a pressure lower than the atmospheric pressure in a separate chamber. With this process, the desorption of the porogen from the insulating film during heating can be restrained therefore an insulating film of high quality can be formed.

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Japanese Office Action mailed Nov. 2, 2004.

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