Film forming apparatus

Details Film forming apparatus Film forming apparatus

2004-10-04

2009-12-01

Michener, Jennifer K (Department: 1795)

Coating apparatus

Gas or vapor deposition

Multizone chamber

C118S632000, C118S729000, C204S298020

Reexamination Certificate

active

07625450

ABSTRACT:
The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.

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Japanese Office Action dated Apr. 10, 2009 (3 pages), and English translation thereof (5 pages), issued in counterpart Japanese Application Serial No. 2003-355471.

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