Film formation apparatus and method for forming a film

Coating processes – Direct application of electrical – magnetic – wave – or... – Sonic or ultrasonic

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Details

4272481, 4272551, 4272552, 4272553, 4272554, 427570, 427578, B06B 100

Patent

active

055695027

ABSTRACT:
A process and apparatus for depositing a film as desired on the surface of a substrate yet at a low temperature, said process comprising introducing a product gas into a film deposition chamber having provided therein a substrate being mounted on a support, and depositing a film on the surface of said substrate by activating said product gas inside said film deposition chamber while applying ultrasonic oscillation to said substrate.

REFERENCES:
patent: 5230925 (1993-07-01), Ohmine

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