Film deposition to enhance sealing yield of microcap...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S640000, C438S455000, C438S612000, C438S107000, C438S123000, C257S704000, C257S417000, C257S457000, C257S678000

Reexamination Certificate

active

06777263

ABSTRACT:

FIELD OF INVENTION
This invention relates to a wafer-level hermetic package for a micro device.
DESCRIPTION OF RELATED ART
A micro-size cap (“microcap”) wafer-level package is formed by bonding a cap wafer to a device wafer. The bonding areas are seal rings formed around each die and vias for receiving via contacts or plugs. Due to leaks from defects or contamination in the bonding areas, a packaged device may fail quality and reliability tests where it is exposed to high temperature and humidity. Thus, what is needed is a method to enhance the seal to increase the final product yield.
SUMMARY
In one embodiment of the invention, a method for forming a wafer package includes forming a die structure, wherein the die structure includes a first wafer, a device mounted on the first wafer, a second wafer mounted atop the first wafer with a first seal ring around the device and a second seal ring around a via contact. The method further includes forming a trench in the second wafer around the first seal ring, filling the trench and the via contact with a sealing agent, patterning a topside of the second wafer to remove the excessive sealing agent and to expose a contact pad of the via contact, and singulating a die around the first seal ring.


REFERENCES:
patent: 6228675 (2001-05-01), Ruby et al.
patent: 6265246 (2001-07-01), Ruby et al.
patent: 6376280 (2002-04-01), Ruby et al.
patent: 6429511 (2002-08-01), Ruby et al.
patent: 6479320 (2002-11-01), Gooch
patent: 6635509 (2003-10-01), Ouellet
patent: 2002/0179986 (2002-12-01), Orcutt et al.
patent: 2003/0214007 (2003-11-01), Tao et al.
patent: 2003/0230798 (2003-12-01), Lin et al.
patent: 2004/0012838 (2004-01-01), Huibers
US patent application Publication No. US 2003/0116825 A1, Publication Date: Jun. 26, 2003.
U.S. patent application Publication No. US 2003/0119308 A1, Publication Date: Jun. 26, 2003.
Patent application Ser. No. 10/277,479, filed Oct. 22, 2002, entitled: “Method For Sealing A Semiconductor Device And Apparatus Embodying The Method”, Inventor: Frank S. Geefay, 15 pages.
Patent application Ser. No. 10/286,729, filed Nov. 1, 2002, entitled: “Die Singulation Using Deep Silicon Etching”, Inventors: Richard C. Ruby et al. , 20 pages.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Film deposition to enhance sealing yield of microcap... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Film deposition to enhance sealing yield of microcap..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Film deposition to enhance sealing yield of microcap... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3352277

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.