Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Reexamination Certificate
2005-07-05
2005-07-05
Lebentritt, Michael S. (Department: 2812)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
C118S715000
Reexamination Certificate
active
06914011
ABSTRACT:
A film deposition system comprises a chamber having an internal space, a support part provided in the internal space of the chamber for supporting a substrate, a gas supply part supplying gas to the internal space and a heating part heating the substrate. After an oxide film is formed on the substrate, the gas supply part supplies oxygen or a gas mixture of oxygen and ozone to the internal space while the heating part heats the substrate. Thus provided is a film deposition system capable of flattening an oxide film.
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Hayashide Yoshio
Kobayashi Kazuo
Morimoto Yasufumi
Lebentritt Michael S.
Luk Olivia T.
McDermott Will & Emery LLP
Renesas Technology Corp.
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