Film deposition apparatus with anti-adhesion film and chamber co

Details Film deposition apparatus with anti-adhesion film and chamber co Film deposition apparatus with anti-adhesion film and chamber co

1996-03-05

1999-10-26

Breneman, Bruce

Coating apparatus

Gas or vapor deposition

118724, 118728, C23C 1600

Patent

active

059721146

ABSTRACT:
An anti-adhesion film, which is difficult for the deposited film to adhere thereto, is formed on the inner surface of a process chamber. A process gas is supplied from a gas supply unit to that position in the process chamber which is opposed to a table, whereupon a metal film or metallic compound film is deposited on the surface of the object. In the film deposition process, the anti-adhesion film serves considerably to reduce the build-up of the metal film deposited on the inner surface of the process chamber, especially that surface of the gas supply unit which is opposed to the table. Although at least a maintenance operation such as wet cleaning is necessary, therefore, the frequency of such operation can be lowered substantially, so that the operating efficiency of the apparatus can be improved.

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