Film deposition apparatus and film deposition method

Details Film deposition apparatus and film deposition method Film deposition apparatus and film deposition method

2010-12-21

2011-10-11

Brewster, William M (Department: 2823)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S778000, C438S680000, C438S685000, C438S790000, C257SE21211, C257SE21276, C257SE21257, C118S728000, C118S730000, C118S719000, C118S712000, C427S010000, C427S595000, C427S569000

Reexamination Certificate

active

08034723

ABSTRACT:
A film deposition apparatus for depositing a film on a substrate by performing a cycle of alternately supplying at least two kinds of reaction gases that react with each other on the substrate to produce a layer of a reaction product in a vacuum chamber is disclosed. The film deposition apparatus includes a ring-shaped locking member that may be provided in or around a wafer receiving portion of a turntable in which the substrate is placed, in order to keep the substrate in the substrate receiving portion.

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