Filling pattern generation apparatus and method including correc

Details Filling pattern generation apparatus and method including correc Filling pattern generation apparatus and method including correc

1991-07-31

1995-08-22

Jankus, Almis R.

395133, G06T 1100

Patent

active

054448344

ABSTRACT:
A pattern generation scheme is initiated by abstaining flag information for filling a pattern is obtained from data of an outline quantized on a bit map. The flag information of the outline is written in a work memory for filling, and a filling pattern is obtained in a scanning direction on the bit map. When a drawing point for filling is present outside a work area of the work memory and in scanning start direction on a scan line, a flag for filling is written in a scanning start point in the work area. Even when the outline overflows the work area, a pattern for correctly filling the interior of the outline in the work area can be generated.

REFERENCES:
patent: 5016001 (1991-05-01), Minagawa et al.
patent: 5018147 (1991-05-01), Kai et al.
Principles of Interactive Computer Graphics, Second Edition, William M. Newman and Robert F. Sproull, Published by McGraw-Hill in 1979, pp. 229-243.

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