Field emission cathode gating for RF electron guns and...

Details Field emission cathode gating for RF electron guns and... Field emission cathode gating for RF electron guns and...

2008-07-01

2008-07-01

Vu, David H (Department: 2821)

Electric lamp and discharge devices: systems

Cathode ray tube circuits

Combined cathode ray tube and circuit element structure

C315S005410, C315S039300

Reexamination Certificate

active

07394201

ABSTRACT:
A novel method of gating electron emission from field-emitter cathodes for radio frequency (RF) electrode guns and a novel cathode that provides a focused electron beam without the need for magnetic fields or a curved cathode surface are provided. The phase and strength of a predefined harmonic field, such as the 3rd harmonic field, are adjusted relative to a fundamental field to cause a field emission cathode to emit electrons at predefined times for the generation of high-brightness electron beams. The emission time is gated responsive to the combined harmonic and fundamental fields and the response of the FE cathode to the combined fields. A planar focusing cathode includes a selected dielectric material, such as a ceramic material, to provide an electron beam emission surface. Metal surfaces are provided both radially around and behind the dielectric material to shape the electric fields that accelerate and guide the beam from the cathode surface.

REFERENCES:
patent: 4118653 (1978-10-01), Vaguine
patent: 5227701 (1993-07-01), McIntyre
patent: 7250727 (2007-07-01), Lewellen et al.

Affiliated with

Also associated with

Rating

Field emission cathode gating for RF electron guns and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field emission cathode gating for RF electron guns and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field emission cathode gating for RF electron guns and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2766849