Field-effect transistor and integrated circuit including the...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S353000, C257S401000, C257SE29137

Reexamination Certificate

active

07999321

ABSTRACT:
A field-effect transistor comprising a movable gate electrode that suppresses a leakage current from the gate electrode, and has a large current drivability and a low leakage current between a source and a drain. The field-effect transistor comprises: an insulating substrate; a semiconductor layer of triangle cross-sectional shape formed on the insulating substrate, having a gate insulation film on a surface, and forming a channel in a lateral direction; fixed electrodes that are arranged adjacent to both sides of the semiconductor layer and in parallel to the semiconductor layer, each of the electrodes having an insulation film on a surface; a source/drain formed at the end part of the semiconductor layer; and the movable gate electrode formed above the semiconductor layer and the fixed electrodes with a gap.

REFERENCES:
patent: 7511994 (2009-03-01), Aritome
patent: 2002/0130354 (2002-09-01), Sckigawa et al.
patent: 2007/0029623 (2007-02-01), Liu et al.
patent: 2002270850 (2002-09-01), None
patent: 2005167163 (2005-06-01), None
N. Abele, et al. “Suspended-Gate MOSFET: bring new MEMS functionality into solid-state MOS transistor” IEDM Tech. Dig., 2005, pp. 1075-1077.
H. Kam et al. “A New Nano-Electrical Field Effect Transistor NEMFET) Design for Low-Power Electronics” IEDM Tech. Dig., 2005, pp. 477-480.
Ionescu et al “Modeling and Design of a Low-voltage SOI Suspended-Gate MOSFET (SG-MOSFET) with a Metal-Over-Gate Architecture” Proceedings of the International Symposium on Quality Electronic Design May 18, 2002, P. 496-601.
Dadgour et al “Design and Analysis of Hybrid NEMS-CMOS Circuits for Ultra Low-Power Applications” Design Automation Conference, Jun. 4, 2007, p. 306-311.

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