Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-01-14
1998-11-24
Chaudhuri, Olik
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257 69, 257350, 257351, 257335, 257338, 257336, 257655, H01L 2712, H01L 27105, H01L 29786
Patent
active
058411704
ABSTRACT:
A field effect transistor is fabricated on an SOI substrate. N-type source and drain regions are arranged apart from each other in a semiconductor thin film of the SOI substrate. A P-type channel region is formed between the source and drain regions. Moreover, a gate electrode is formed over the channel region to cover the channel region through a gate oxide film. Extreme portions of the channel region, adjacent to the source and drain regions, have higher doping concentrations than in a center portion thereof. Furthermore, the gradient of the doping profile in the channel region is adjusted so as to reduce the current gain of a parasitic transistor in the field effect transistor. This structure enables a reduction of the channel length of the field effect transistor to the sub-half-micron order without deteriorating the electrical characteristics of the field effect transistor.
REFERENCES:
patent: 5449937 (1995-09-01), Arimura
patent: 5477073 (1995-12-01), Wakai et al.
patent: 5567966 (1996-10-01), Hwang
Y. Okumura, et al., "Source-to-Drain Nonuniformly Doped Channel (NUDC) MOSFET Structures for High Current Drivability and Threshold Voltage Controllability," IEEE Trans ED, vol. 39, No. 11, Nov. 1992, pp. 2541-2552.
Apr. 1995 Symposium on VLSI Technology Digest of Technical Papers, Terauchi et al pp. 35 & 36; Supression of the Floating-Body Effects in SOI MOSFETs by Bandgap Engineering.
"Reduction of Kink Effect in Thin-film SOI MOSFETS", IEEE Electron Device Letters, Feb. 1998, USA, vol. 9, NR. 2, pp. 97-99, ISSN 0741-3106 XP002056395.
Adan Alberto Oscar
Kaneko Seiji
Chaudhuri Olik
Guay John F.
Sharp Kabushiki Kaisha
LandOfFree
Field effect transistor and CMOS element having dopant exponenti does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Field effect transistor and CMOS element having dopant exponenti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect transistor and CMOS element having dopant exponenti will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1706024