Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2011-04-26
2011-04-26
Garber, Charles (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
Reexamination Certificate
active
07932177
ABSTRACT:
A field-effect transistor is provided, which includes an organic thin film and which can realize a low threshold voltage while a stable, high field-effect mobility is ensured at the same time. In a field-effect transistor provided with a gate electrode, a source electrode, a drain electrode, a semiconductor film, a gate insulating film, and a substrate, the gate insulating film is formed from a plurality of insulating layers. Here, a first insulating layer in contact with the semiconductor film is formed from poly-p-xylylene formed into a film by a CVD method. A second insulating layer is formed from, for example, cyanoethylpullulan, and the dielectric constant is specified to be higher than that of the first insulating layer.
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Onoue et al., “Low-Operating-Voltage Organic Field-Effect Transistors with Poly-p-Xylylene/High-k Polymer Bilayer Gate Dielectric”, Japanese Journal of Applied Physics, Japan Society of Applied Physics, Japan, vol. 45., No. 29., Jul. 21, 2006, pp. L770-L772.
Official Communication issued in corresponding European Patent Application No. 07713728.9, issued on Jan. 18, 2011.
Onoue Tomoaki
Tsutsui Tetsuo
Yasuda Takeshi
Garber Charles
Keating & Bennett LLP
Murata Manufacturing Co. Ltd.
Stevenson André C
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