Field effect transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257284, 257344, 257346, 257402, H01L 2948, H01L 2956, H01L 2964

Patent

active

054364892

ABSTRACT:
A field effect transistor includes a source electrode and a drain electrode disposed on a compound semiconductor substrate, a gate electrode having a T-shaped cross-section, and a gate pad having a T-shaped cross-section disposed at one side of the gate electrode, the gate electrode and the gate pad having a reinforcing thin metal film reinforcing the gate electrode on the rear surface of an overhanging portion of the head of the gate electrode and gate pad. Therefore, the head of the gate electrode is hardly ever separated from the leg of the gate electrode and a highly reliable T-shaped gate electrode is obtained. The gate electrode leg is produced using a thin film to which a pattern of the gate electrode is transcribed as a mask, thereby reducing the length of the head of the gate electrode. Accordingly, a T-shaped gate electrode is located in a deeper gate recess than ever without causing deterioration in the repeatability of its production.

REFERENCES:
patent: 4979010 (1990-12-01), Brigayen
patent: 5220186 (1993-06-01), Kasai et al.
patent: 5288654 (1994-02-01), Kasai et al.
patent: 5358885 (1994-10-01), Oku et al.
Hosogi et al., "Photo/EB Hybrid Exposure Process For T-Shaped Gate Superlow-Noise HEMTs", Electronics Letters, vol. 27, No. 22, Oct. 1991, pp. 2011-2012.

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