Fiducial marks for charged-particle-beam exposure apparatus and

Details Fiducial marks for charged-particle-beam exposure apparatus and Fiducial marks for charged-particle-beam exposure apparatus and

1998-04-13

2000-05-09

Breneman, Bruce

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C03C 2506

Patent

active

060599812

ABSTRACT:
Methods are disclosed for making fiducial marks for charged-particle-beam (CPB) exposure apparatus, especially for performing high-accuracy measurements of aberrations of the CPB optical system in such apparatus. The fiducial marks are made by forming multiple features in a monocrystalline Si substrate. The features are longitudinally extended and are preferably in two groups wherein the features in one group are longitudinally extended in a direction that is perpendicular to the direction in which the features in the other group are longitudinally extended. Where the (110) plane of the monocrystalline Si is the surface of the substrate, the longitudinal direction of each feature is oriented in the <112> direction of the (110) plane.

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patent: 5838413 (1998-11-01), Matoba et al.
patent: 5883012 (1999-03-01), Chiou et al.

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