Fidelity ratio corrected photomasks and methods of fabricating f

Details Fidelity ratio corrected photomasks and methods of fabricating f Fidelity ratio corrected photomasks and methods of fabricating f

1996-11-21

1998-09-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430394, G03F 900

Patent

active

058043390

ABSTRACT:
Methods of fabricating a photomask including a correction exposure utilizing a correction exposure mask. The methods include exposing a photoresist with an activating agent utilizing a predetermined exposure pattern with a first exposure dosage. The photoresist is also exposed with a correction exposure dosage of an activating agent using a correction exposure pattern. The correction exposure dosage is less than the first exposure dosage. The correction exposure pattern may include a portion of the predetermined exposure pattern having a low pattern fidelity ratio. Photomasks fabricated according to the methods of the present invention are also provided.

REFERENCES:
patent: 5082762 (1992-01-01), Takahashi
patent: 5532090 (1996-07-01), Borodovsky

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