Static information storage and retrieval – Systems using particular element – Ferroelectric
Reexamination Certificate
2005-05-03
2005-05-03
Nguyen, Van Thu (Department: 2824)
Static information storage and retrieval
Systems using particular element
Ferroelectric
Reexamination Certificate
active
06888736
ABSTRACT:
A method of storing and accessing two data bits in a single ferroelectric FET includes selectively polarizing two distinct ferroelectric regions in the same gate dielectric layer separated by a non-ferroelectric dielectric region. A first ferroelectric region is sandwiched between the substrate and the gate terminal in the region of the source and is polarized in one of two states to form a first data bit within the FET. A second ferroelectric region is sandwiched between the substrate and the gate terminal in the region of the drain and is polarized in one of two states to form a second data bit within the FET. Detection of the first data bit is accomplished by selectively applying a read bias to the FET terminals, a first current resulting when a first state is stored and a second current resulting when a second state is stored. The polarization of the second data bit is accomplished by reversing the source and drain voltages.
REFERENCES:
patent: 3832700 (1974-08-01), Wu et al.
patent: 4860254 (1989-08-01), Pott et al.
patent: 5046043 (1991-09-01), Miller et al.
patent: 5060191 (1991-10-01), Nagasaki et al.
patent: 5070385 (1991-12-01), Evans, Jr. et al.
patent: 5146299 (1992-09-01), Lampe et al.
patent: 5198994 (1993-03-01), Natori
patent: 5227855 (1993-07-01), Momose
patent: 5302842 (1994-04-01), Chan
patent: 5307305 (1994-04-01), Takasu
patent: 5345414 (1994-09-01), Nakamura
patent: 5365094 (1994-11-01), Takasu
patent: 5378905 (1995-01-01), Nakamura
patent: 5384729 (1995-01-01), Sameshima
patent: 5418389 (1995-05-01), Watanabe
patent: 5434811 (1995-07-01), Evans, Jr. et al.
patent: 5479317 (1995-12-01), Ramesh
patent: 5515311 (1996-05-01), Mihara
patent: 5519235 (1996-05-01), Ramesh
patent: 5523964 (1996-06-01), McMillan et al.
patent: 5536672 (1996-07-01), Miller et al.
patent: 5541870 (1996-07-01), Mihara et al.
patent: 5541871 (1996-07-01), Nishimura et al.
patent: 5541873 (1996-07-01), Nishimura et al.
patent: 5559733 (1996-09-01), McMillan et al.
patent: 5563081 (1996-10-01), Ozawa
patent: 5578846 (1996-11-01), Evans, Jr. et al.
patent: 5621681 (1997-04-01), Moon
patent: 5623439 (1997-04-01), Gotoh et al.
patent: 5640030 (1997-06-01), Kenney
patent: 5736759 (1998-04-01), Haushalter
patent: 5739563 (1998-04-01), Kawakubo et al.
patent: 5744374 (1998-04-01), Moon
patent: 5757042 (1998-05-01), Evans, Jr. et al.
patent: 5768185 (1998-06-01), Nakamura et al.
patent: 5780886 (1998-07-01), Yamanobe et al.
patent: 5789775 (1998-08-01), Evans, Jr. et al.
patent: 5808676 (1998-09-01), Biegelsen et al.
patent: 5822239 (1998-10-01), Ishihara et al.
patent: 5825317 (1998-10-01), Anderson et al.
patent: 5858533 (1999-01-01), Greuter et al.
patent: 5872739 (1999-02-01), Womack
patent: 5877977 (1999-03-01), Essaian
patent: 5886920 (1999-03-01), Marshall et al.
patent: 5887117 (1999-03-01), Desu et al.
patent: 5919515 (1999-07-01), Yano et al.
patent: 5946224 (1999-08-01), Nishimura
patent: 5953061 (1999-09-01), Biegelsen et al.
patent: 5955213 (1999-09-01), Yano et al.
patent: 5959879 (1999-09-01), Koo
patent: 5962884 (1999-10-01), Hsu et al.
patent: 5977577 (1999-11-01), Evans, Jr.
patent: 5998819 (1999-12-01), Yokoyama et al.
patent: 6025735 (2000-02-01), Gardner et al.
patent: 6027947 (2000-02-01), Evans et al.
patent: 6031754 (2000-02-01), Derbenwick et al.
patent: 6066868 (2000-05-01), Evans, Jr.
patent: 6067244 (2000-05-01), Ma et al.
patent: 6069381 (2000-05-01), Black et al.
patent: 6087688 (2000-07-01), Furuta et al.
patent: 6091621 (2000-07-01), Wang et al.
patent: 6104049 (2000-08-01), Solayappan et al.
patent: 6121648 (2000-09-01), Evans, Jr.
patent: 6130103 (2000-10-01), Cuchiaro et al.
patent: 6140672 (2000-10-01), Arita et al.
patent: 6144579 (2000-11-01), Taira
patent: 6147895 (2000-11-01), Kamp
patent: 6150184 (2000-11-01), Evans et al.
patent: 6151241 (2000-11-01), Hayashi et al.
patent: 6151242 (2000-11-01), Takashima
patent: 6165802 (2000-12-01), Cuchiaro et al.
patent: 6171934 (2001-01-01), Joshi et al.
patent: 6194751 (2001-02-01), Evans, Jr.
patent: 6201731 (2001-03-01), Kamp et al.
patent: 6207465 (2001-03-01), Cuchiaro et al.
patent: 6225156 (2001-05-01), Cuchiaro et al.
patent: 6225654 (2001-05-01), Evans, Jr. et al.
patent: 6225656 (2001-05-01), Cuchiaro et al.
patent: 6236076 (2001-05-01), Arita et al.
patent: 6245451 (2001-06-01), Kamisawa et al.
patent: 6245580 (2001-06-01), Solayappan et al.
patent: 6246602 (2001-06-01), Nishimura
patent: 6255121 (2001-07-01), Arita et al.
patent: 6256220 (2001-07-01), Kamp
patent: 6285577 (2001-09-01), Nakamura
patent: 6307225 (2001-10-01), Kijima et al.
patent: 6310373 (2001-10-01), Azuma et al.
patent: 6319542 (2001-11-01), Summerfelt et al.
patent: 6322849 (2001-11-01), Joshi et al.
patent: 6326315 (2001-12-01), Uchiyama et al.
patent: 6335550 (2002-01-01), Miyoshi et al.
patent: 6339238 (2002-01-01), Lim et al.
patent: 6358758 (2002-03-01), Arita et al.
patent: 6362068 (2002-03-01), Summerfelt et al.
patent: 6365927 (2002-04-01), Cuchiaro et al.
patent: 6370056 (2002-04-01), Chen et al.
patent: 6372518 (2002-04-01), Nasu et al.
patent: 6373743 (2002-04-01), Chen et al.
patent: 6396093 (2002-05-01), Nakamura
patent: 6396095 (2002-05-01), Shimada et al.
patent: 6438019 (2002-08-01), Hartner et al.
patent: 6438031 (2002-08-01), Fastow
patent: 6442074 (2002-08-01), Hamilton et al.
patent: 6469334 (2002-10-01), Arita et al.
patent: 6623985 (2003-09-01), Igarashi
patent: 20020083959 (2002-07-01), Morita et al.
patent: 408055919 (1996-02-01), None
patent: WO9898/13300 (1998-02-01), None
Tokumitsu, Eisuke et al, “Characterization of MF(M)IS structures using P(L)ZT and Y2O3films”, Jpn. J. of Appl.Phys., vol. 39, Sep. 2000, pp. 5456-5459.
Tokumitsu, Eisuke et al, “Preparation of STN films by the sol-gel method for ferroelectric gate structures”, IMF-10 Madrid/Spain (2001), pp. 105-110.
Tokumitsu, Eisuke et al, “Electrical Properties of MFIS and MFMIS FETs using ferroelectric SBT film and STO/SiON buffer layer”, Jpn. J. of Appl.Phys., vol. 39, Apr. 2000, pp. 2125-2130.
Shin, Chang Ho et al, “Fabrication and characterization of MFIS FET using A12O3insulating layer for nonvolatile memory”, ISIF 2001, 9 pages.
Lee, Ho Nyung et al., “CV characteristics of Pt/SBT/CeO2/Si structure for non volatile memory devices”, ISIF, 4 pages.
Choi, Hoon Sang et al, “Crystal Structure and electrical properties of Pt/SBT/ZrO2/Si”, J. of Korean Phys. Soc., vol. 39, No. 1, Jul. 2001, pp. 179-183.
Li, W.P. et al, “Improvement of MFS structures without buffer layers between Si and ferroelectric film”, Applied Physics A, Springer (2000), pp. 85-87.
Han, Jin-Ping et al, “Memory effects of SBT capacitors on silicon with silicon nitride buffer”, Integrated Ferroelectrics, 1998, vol. 22, pp. 213-221.
Miller, S.L. and McWhorter, P.J., “Device Physics of the ferroelectric memory field effect transistor”, ISIF Jun. 1992, pp. 5999-6010.
Kalkur, T.S., “Characteristics of MFS capacitors and MFSFETs with BaMgF4gate dielectrics”, ISIF 1992, 1 page.
Wu, S.Y., IEEE Trans.Electron Devices ED 21, 499 (1974). An excellent review article referencing the same work was published in 1992 by Sinharoy, S. et al, “Integration of ferroelectric thin films into nonvolatile memories”, J. Vac.Sci.Technol.A 10(4), Jul./Aug. 1992, pp. 1554-1561.
Chung, Ilsub et al., “Data Retention: Fabrication and characterization of MFISFET using CMOS process for single transistor memory applications”, Integrated Ferroelectrics, 1999, vol. 27, pp. 31-39.
Miller, S.L. and McWhorter, P.J., “Theoretical investigation of a ferroelectric transistor: Physics of the ferroelectric nonvolatile memory field effect transistor”, J. Appl.Phys. 72 (12), Sep. 9, 1992, pp. 5999-6010.
Smyth, D.M., “Charge Motion in ferroelectric thin films”, Ferroelectrics, vol. 116, pp. 117-124 (1991), pp. 117-124.
Wu, S.Y. “A ferroelectric memory device, Metal-Ferroelectric-Semiconductor Transistor”, IEEE Trans.Electron
Dimmler Klaus
Gnadinger Alfred P.
COVA Technologies, Inc.
Hogan & Hartson LLP
Kubida William J.
Luu Pho M.
Meza Peter J.
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