Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-09-15
2000-05-30
Tran, Minh Loan
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257314, 257315, 257324, 257379, 257380, H01L 2976, H01L 2988, H01L 2992, H01L 2994
Patent
active
060693819
ABSTRACT:
The present invention proposes a new type of single-transistor memory device, which stores information using the polarization of a ferroelectric material. The device is a floating-gate FET, with a ferroelectric material positioned between the gate and the floating gate, and a resistance, preferably in the form of a thin SiO.sub.2 dielectric between the floating gate and the transistor channel. Unlike previous designs, in this device the floating gate is both capacitively and resistively coupled to the transistor channel, which enables the device to be both read and written using low voltages. This device offers significant advantages for operation at low voltages and at high speeds, for repeated cycling of over 10.sup.10 times, since device durability is limited by the ferroelectric endurance rather than oxide breakdown, and for integration at gigabit densities.
REFERENCES:
patent: 4888630 (1989-12-01), Paterson
patent: 5365094 (1994-11-01), Takasu
patent: 5511020 (1996-04-01), Hu et al.
patent: 5523964 (1996-06-01), McMillan et al.
patent: 5640345 (1997-06-01), Okuda et al.
F.Y. Chen et al., "A Nonvolatile Ferroelectric Memory Device with a Floating Gate" Appl. Phys. Lett. 69(21), Nov. 18, 1996, p. 3275-6.
J. Yu et al., "Formation and Characteristics of Pb(Zr,Ti)03 Field-Effect Transistor with a Si02 Buffer Layer" Appl. Phys. Lett. 70(4), Jan. 27, 1997 p. 490-2.
T. Nakamura et al., "WP 4.3: A Single-Transistor Ferroelectric Memory Cell", 1995 IEEE International Solid-State Circuits Conference, p. 689.
T. Rost et al., "Ferroelectric Switching of a Field-Effect Transistor with a Lithium Niobate Gate Insulator", Appl. Phys. Lett., vol. 59, No. 27, Dec. 30, 1991, p. 3654-6.
T. Hirai et al., "Formation of Metal/Ferroelectric/Insulator/Semiconductor Structure with a Ce02 Buffer Layer", Jpn.J.Appl.Phys. vol.33 (1994) p.5219-5222, Part 1, No. 9B, Sep. 1994.
E. Tokumitsu, et al., "Nonvolatile Memory Operations of Metal-Ferroelectric-Insulator-Semiconductor (MFIS) Fet's . . . " IEEE Electron Device Letters, vol.18,No. 4, Apr. 1997p.160-2.
K. Sugibuchi, et al., "Ferroelectric Field-Effect Memory Device Using Bi4Ti3012 Film" Journal of Applied Physics, vol. 46, No. 7, Jul. 1975, p. 2877-2881.
Black Charles Thomas
Welser Jeffrey John
International Business Machines - Corporation
Nguyen Cuong Quang
Tran Minh Loan
LandOfFree
Ferroelectric memory transistor with resistively coupled floatin does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ferroelectric memory transistor with resistively coupled floatin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ferroelectric memory transistor with resistively coupled floatin will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1912209