Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-09-08
2008-12-16
Warren, Matthew E (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S310000, C257SE27104
Reexamination Certificate
active
07465980
ABSTRACT:
A ferroelectric memory device includes a gate electrode formed on a semiconductor body via a ferroelectric film, first and second diffusion regions being formed in the semiconductor body at respective sides of a channel region, wherein the ferroelectric film comprises a first region located in the vicinity of the first diffusion region, a second region located in the vicinity of the second diffusion region, and a third region located between the first and second regions, wherein the first, second and third regions carry respective, mutually independent polarizations.
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Taiwanese Office Action dated Feb. 26, 2008.
Aizawa Koji
Arimoto Yoshihiro
Hasegawa Satoshi
Hoko Hiromasa
Ishihara Hiroshi
Fujitsu Limited
Kratz Quintos & Hanson, LLP
Tokyo Institute of Technology
Warren Matthew E
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