Ferroelectric memory device

Static information storage and retrieval – Systems using particular element – Ferroelectric

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36518501, 257295, G11C 1122, G11C 1604

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active

061445797

ABSTRACT:
A ferroelectric memory device includes a channel region formed in a substrate having a first conductivity type, a first diffusion region formed in the substrate at a first side of the channel region with a second, opposite conductivity type, a second diffusion region formed in the substrate at a second side of said channel region with the second conductivity type, a ferroelectric film formed on the substrate so as to cover the channel region, and a gate electrode provided on the ferroelectric film, wherein the channel region has the second conductivity type.

REFERENCES:
patent: 3426255 (1969-02-01), Heywang
patent: 5365094 (1994-11-01), Takasu
patent: 5449935 (1995-09-01), Nakamura
patent: 5523964 (1996-06-01), McMillan
patent: 5623439 (1997-04-01), Gotoh et al.
patent: 5633821 (1997-05-01), Nishimura
patent: 5768185 (1998-06-01), Nakamura et al.
patent: 5812442 (1998-09-01), Yoo
patent: 5877977 (1999-03-01), Essaian
patent: 5946224 (1999-08-01), Nishimura
Prins M W J et al.: "Depletion-Type Thin-Film Transistors With a Ferroelectric Insulator" Applied Physics Letters, vol. 70, No. 4, Jan. 27, 1997, pp. 458-460, XP000680623 (p. 459, col. 1, line 5-line 9, figure 2).
Yukio Watanabe: "Epitaxial All-Perovskite Ferroelectric Field Effect Transistor With a Memory Retention" Applied Physics Letters, vol. 66, No. 14, Apr. 3, 1994, pp. 1770-1772, XP000500955 (figure 1).

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