Feed forward critical dimension control

Details Feed forward critical dimension control Feed forward critical dimension control

2006-08-01

2006-08-01

Tsai, Carol S. W. (Department: 2857)

Data processing: measuring, calibrating, or testing

Measurement system

Performance or efficiency evaluation

C702S081000, C702S172000, C356S630000

Reexamination Certificate

active

07085676

ABSTRACT:
Feed forward techniques can be used to improve optical metrology measurements for microelectronic devices. Metrology tools can be used to measure parameters such as critical dimension, profile, index of refraction, and thickness, as well as various material properties. Three-dimensional feature characterizations can be performed, from which parameters can be extracted and correlations executed. Process fingerprints on a wafer can be tracked after each process step, such that correlation between profile and structure parameters can be established and deviations from specification can be detected instantaneously. A “feed forward” approach allows information relating to dimensions, profiles, and layer thicknesses to be passed on to subsequent process steps. By retaining information from previous process steps, calculations such as profile determinations can be simplified by reducing the number of variables and degrees of freedom used in the calculation.

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Presentation slide show by Infineon Technologies, “Feed-Forward CD Control,”SPIE 5378-14, Mar. 2004, 27 pages in length.
Igor Jekauc et al., “Complementary Feed-Forward and Feeback Method for Improved Critical Dimension Control,”SPIE 5378-14(2004), 8 pages in length.

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