Fast transition RF impedance matching network for plasma reactor

Details Fast transition RF impedance matching network for plasma reactor Fast transition RF impedance matching network for plasma reactor

1995-11-27

1998-09-29

Lee, Benny

Wave transmission lines and networks

Automatically controlled systems

Impedance matching

333 32, 333 99PL, 31511121, H03H 740

Patent

active

058150471

ABSTRACT:
An impedance matching network for an RF coupled plasma reactor having RF excitation apparatus receiving RF power through the impedance matching network from an RF generator for producing a plasma in the reactor has at least one capacitor connected to the output of the RF generator and having a capacitance value providing an impedance match to the plasma impedance during a steady state of the plasma, at least a first rapidly tunable capacitor connected in parallel with the one capacitor, the rapidly tunable capacitor being rapidly switchable between a high capacitance value providing a match to the plasma impedance during the onset of plasma ignition and a lesser minimum capacitance value, and a controller for rapidly switching the rapidly tunable capacitor from the high to the lesser capacitance value upon reaching the plasma steady state.

REFERENCES:
patent: 3436333 (1969-04-01), Beaudry
patent: 4375051 (1983-02-01), Theall
patent: 4629940 (1986-12-01), Gagne et al.
patent: 4679007 (1987-07-01), Reese et al.
patent: 5053725 (1991-10-01), Gesche et al.
patent: 5288971 (1994-02-01), Knipp

Affiliated with

Also associated with

Rating

Fast transition RF impedance matching network for plasma reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fast transition RF impedance matching network for plasma reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fast transition RF impedance matching network for plasma reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-689194