Faraday shield disposed within an inductively coupled plasma...

Details Faraday shield disposed within an inductively coupled plasma... Faraday shield disposed within an inductively coupled plasma...

2007-05-29

2007-05-29

Alejandro-Mulero, Luz (Department: 1763)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With radio frequency antenna or inductive coil gas...

C118S7230IR, C118S7230AN

Reexamination Certificate

active

10232564

ABSTRACT:
An apparatus and method is provided for positioning and utilizing a Faraday shield in direct exposure to a plasma within an inductively coupled plasma etching apparatus. Broadly speaking, the Faraday shield configuration maintains a condition of an etching chamber window. At a minimum, positioning the Faraday shield between the window and the plasma prevents erosion of the window resulting from plasma sputter and shunts heat generated by an etching process away from the window.

REFERENCES:
patent: 6280563 (2001-08-01), Baldwin et al.
patent: 6503364 (2003-01-01), Masuda et al.
patent: 6666982 (2003-12-01), Brcka

Affiliated with

Also associated with

Rating

Faraday shield disposed within an inductively coupled plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Faraday shield disposed within an inductively coupled plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Faraday shield disposed within an inductively coupled plasma... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3796618