Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...
Reexamination Certificate
2007-05-29
2007-05-29
Alejandro-Mulero, Luz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With radio frequency antenna or inductive coil gas...
C118S7230IR, C118S7230AN
Reexamination Certificate
active
10232564
ABSTRACT:
An apparatus and method is provided for positioning and utilizing a Faraday shield in direct exposure to a plasma within an inductively coupled plasma etching apparatus. Broadly speaking, the Faraday shield configuration maintains a condition of an etching chamber window. At a minimum, positioning the Faraday shield between the window and the plasma prevents erosion of the window resulting from plasma sputter and shunts heat generated by an etching process away from the window.
REFERENCES:
patent: 6280563 (2001-08-01), Baldwin et al.
patent: 6503364 (2003-01-01), Masuda et al.
patent: 6666982 (2003-12-01), Brcka
Comendant Keith
Steger Robert J.
Alejandro-Mulero Luz
Lam Research Corporation
Martine & Penilla & Gencarella LLP
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