Faraday shield disposed within an inductively coupled plasma...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With radio frequency antenna or inductive coil gas...

Reexamination Certificate

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C118S7230IR, C118S7230AN

Reexamination Certificate

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10232564

ABSTRACT:
An apparatus and method is provided for positioning and utilizing a Faraday shield in direct exposure to a plasma within an inductively coupled plasma etching apparatus. Broadly speaking, the Faraday shield configuration maintains a condition of an etching chamber window. At a minimum, positioning the Faraday shield between the window and the plasma prevents erosion of the window resulting from plasma sputter and shunts heat generated by an etching process away from the window.

REFERENCES:
patent: 6280563 (2001-08-01), Baldwin et al.
patent: 6503364 (2003-01-01), Masuda et al.
patent: 6666982 (2003-12-01), Brcka

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