Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation
Reexamination Certificate
2006-11-07
2006-11-07
Berman, Jack (Department: 2881)
Radiant energy
Irradiation of objects or material
Ion or electron beam irradiation
C250S492210, C250S397000, C327S071000, C327S072000, C118S7230ER, C118S72300R, C438S513000, C438S723000
Reexamination Certificate
active
07132672
ABSTRACT:
A Faraday dose and uniformity monitor can include a magnetically suppressed annular Faraday cup surrounding a target wafer. A narrow aperture can reduce discharges within Faraday cup opening. The annular Faraday cup can have a continuous cross section to eliminate discharges due to breaks. A plurality of annular Faraday cups at different radii can independently measure current density to monitor changes in plasma uniformity. The magnetic suppression field can be configured to have a very rapid decrease in field strength with distance to minimize plasma and implant perturbations and can include both radial and azimuthal components, or primarily azimuthal components. The azimuthal field component can be generated by multiple vertically oriented magnets of alternating polarity, or by the use of a magnetic field coil. In addition, dose electronics can provide integration of pulsed current at high voltage, and can convert the integrated charge to a series of light pulses coupled optically to a dose controller.
REFERENCES:
patent: 5814823 (1998-09-01), Benveniste
patent: 6020592 (2000-02-01), Liebert et al.
patent: 6050218 (2000-04-01), Chen et al.
patent: 2003/0101935 (2003-06-01), Walther
patent: 2003/0222227 (2003-12-01), Richards et al.
patent: 0 994 203 (2000-04-01), None
patent: 61227357 (1986-10-01), None
Dorai Rajesh
Koo Bon-Woong
Leavitt Chris
Miller Timothy
Pedersen Bjorn O.
Berman Jack
Foley & Hoag LLP
Hashmi Zia R.
Varian Semiconductor Equipment Associates Inc.
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