X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
1999-11-24
2001-02-20
Bruce, David V. (Department: 2876)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S057000, C378S086000, C378S088000, C378S149000, C378S160000
Reexamination Certificate
active
06192104
ABSTRACT:
TECHNICAL FIELD
The present invention relates to a system and method for inspecting an object with penetrating radiation wherein a source of such radiation provides both a fan beam and a pencil beam that may be scanned across the inspected object.
BACKGROUND OF THE INVENTION
X-ray systems are commonly employed for such applications as the inspection of materials or containers by illuminating the material or container from the outside by means of fan beams. A fan beam refers to a beam having an opening angle in one dimension substantially larger than the width of the beam in a dimension orthogonal to the first. Additionally, the use of a pencil beam, scanned across the object under inspection is also known and used in the art.
The concurrent or alternating application of one or more fan beams and one or more pencil beams is the subject, for example, of copending provisional application No. 60/072,890, filed Jan. 28, 1998, which is herein incorporated by reference.
The methods known in the art for concurrently applying multiple beams require multiple sources penetrating radiation.
SUMMARY OF THE INVENTION
In accordance with one aspect of the invention, in one of its embodiments, there is provided an inspection system for inspecting an object such as a cargo enclosure. The system has a source of penetrating radiation for providing a pencil beam and a fan beam, the pencil beam being noncoplanar with the fan beam. Additionally, the system has a first detector arrangement for detecting penetrating radiation from the fan beam transmitted through the object and generating a transmitted radiation signal. Similarly, the system has a second detector arrangement for detecting penetrating radiation from the pencil beam scattered by the object and generating a scattered radiation signal. Finally, the system has a controller for determining at least one characteristic of the object based at least on the transmitted and scattered radiation signals.
In accordance with alternate embodiments of the invention, the source of penetrating radiation may be an x-ray source, including an x-ray tube or a linear accelerator (LINAC), and may be pulsed or continuous. The system may have a collimator for shaping the fan beam and a scanner arrangement for varying the orientation of the pencil beam with respect to the object. Additionally, the object may be in motion with respect to at least one of the pencil and fan beams.
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Patent Abstracts of Japan—JP 05 323039 A (Toshiba Corp.), Dec. 7, 1993.
Adams William
Grodzins Lee
American Science and Engineering, Inc.
Brombert & Sunstein LLP
Bruce David V.
Ho Allen C
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