Failure analyzing apparatus and failure analyzing method for...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C359S382000, C250S307000

Reexamination Certificate

active

06553546

ABSTRACT:

CROSS-REFERENCE TO RELATED APPLICATIONS
This application is based upon and claims the benefit of priority from the prior Japanese Patent Applications No. 11-320007, filed Nov. 10, 1999; and No. 2000-164692, filed Jun. 1, 2000, the entire contents of which are incorporated herein by reference.
BACKGROUND OF THE INVENTION
The present invention relates to a failure analyzing apparatus and a failure analyzing method for a semiconductor integrated circuit, which specify or localize the location of a failure (hereinafter referred to as “failure location”) by using an emission image formed by hot electrons that are emitted from the surface of a semiconductor integrated circuit chip.
Due to the recent ever-improving scale and integration density of very large scale semiconductor integrated circuits (VLSIs), it has become significantly important to develop the technique of specifying failure locations and shorten the analyzing time.
The typical analysis on the function failure of a VLSI is a failure location specifying scheme which uses a simulator and electron beam (EB) tester.
This conventional scheme using a simulator and EB tester establishes a link to a CAD (Computer Aided Design) unit, generates a failure dictionary and narrows down probe points based on the results of the actual simulation analysis and failure simulation results, and then performs failure analysis by actually using a simulator and EB tester. The conventional scheme therefore requires a significant amount of pre-analysis processing, which is likely to increase the time needed to specify a failure location.
There is a standby EMS (Emission Micro Scope) scheme which holds a device, such as a semiconductor integrated circuit chip, in a standby state or a stable operational state, integrates hot electrons that are generated from a failure location to acquire an emission image, and specifies the failure location based on the emission image.
This scheme cannot however accomplish EMS analysis on dynamic type products which are not easily held at a stable operational state and analog-mixed products that have a circuit in which a through current always flows.
In short, the conventional failure analyzing apparatus and method that use a simulator and EB tester undesirably requires a long time for specifying a failure location. Further, the conventional failure analyzing apparatus and method that employ the standby EMS scheme cannot perform failure analysis on dynamic type products and analog-mixed products.
BRIEF SUMMARY OF THE INVENTION
Accordingly, it is an object of the present invention to provide a failure analyzing apparatus and failure analyzing method for a semiconductor integrated circuit, which can shorten the time needed to specify a failure location and can perform failure analysis on dynamic type products and analog-mixed products.
It is another object of this invention to provide a failure analyzing apparatus for a semiconductor integrated circuit which can specify a real failure location.
To achieve the above objects, according to one aspect of this invention, there is provided a failure analyzing apparatus for a semiconductor integrated circuit, which comprises a test signal generating section for generating test signals for operating a semiconductor integrated circuit chip; an emission image detecting section for detecting an emission image formed by hot electrons emitted from a good semiconductor integrated circuit chip and an emission image formed by hot electrons emitted from a target semiconductor integrated circuit chip to be subjected to failure analysis, both chips being operable upon reception of the test signal; and an image processing section, connected to the emission image detecting section, for specifying a failure location in the target semiconductor integrated circuit chip based on both emission images detected by the emission image detecting section.
According to another aspect of this invention, there is provided a failure analyzing method for a semiconductor integrated circuit, which comprises the steps of operating a good semiconductor integrated circuit chip and a target semiconductor integrated circuit chip to be subjected to failure analysis by supplying test signals to the good semiconductor integrated circuit chip and the target semiconductor integrated circuit chip from a testing device; detecting an emission image formed by hot electrons emitted from the good semiconductor integrated circuit chip and an emission image formed by hot electrons emitted from the target semiconductor integrated circuit chip by using an emission analyzer; and specifying a failure location in the target semiconductor integrated circuit chip by performing image processing on both emission images detected.
According to a further aspect of this invention, there is provided a failure analyzing apparatus for a semiconductor integrated circuit, which comprises a function tester for generating test signals and supplying the test signals to a semiconductor integrated circuit chip to execute a function test thereof; an emission analyzer for detecting an emission image formed by hot electrons emitted from the semiconductor integrated circuit chip when the function test is performed by the function tester; an image processing device, connected to the emission analyzer, for specifying a failure location in a target semiconductor integrated circuit chip to be subjected to failure analysis, based on an emission image of a good semiconductor integrated circuit chip detected by the emission analyzer and an emission image of the target semiconductor integrated circuit chip; and a display device, connected to the image processing device, for displaying the failure location specified by the image processing device.
According to a still further aspect of this invention, there is provided a failure analyzing apparatus for a semiconductor integrated circuit, which comprises a function tester for generating supply voltages and test signals and supplying the supply voltages and the test signals to a semiconductor integrated circuit chip to execute a function test thereof; an emission analyzer for detecting an emission image by integrating hot electrons emitted from the semiconductor integrated circuit chip when the function test is performed by the function tester, an integration time for the hot electrons being variable; an image processing device, connected to the emission analyzer, for specifying a failure location in a target semiconductor integrated circuit chip to be subjected to failure analysis, based on an emission image of a good semiconductor integrated circuit chip detected by the emission analyzer and an emission image of the target semiconductor integrated circuit chip; a display device, connected to the image processing device, for displaying the failure location specified by the image processing device; and a condition providing device for altering an operational condition by variously changing at least a value of the supply voltages generated by the function tester and/or the integration time for hot electrons in the emission analyzer, causing the function tester to operate the target semiconductor integrated circuit chip in each alteration to check a number of occurrences of false emission caused by emission images detected by the emission analyzer, and acquiring that operational condition under which the number of occurrences of false emission becomes equal to or smaller than a predetermined value, whereby an operation of the function tester and/or an operation of the emission analyzer is controlled based on the operational condition acquired by the condition providing device.
According to a yet still further aspect of this invention, there is provided a failure analyzing apparatus for a semiconductor integrated circuit, which comprises a function tester for generating supply voltages and test signals and supplying the supply voltages and the test signals to a semiconductor integrated circuit chip to execute a function test thereof; an emission analyzer for detecting an emission image by integrating hot elect

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