Facilitating optical proximity effect correction through...

Details Facilitating optical proximity effect correction through... Facilitating optical proximity effect correction through...

2005-01-25

2005-01-25

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S396000, C430S005000, C430S313000, C355S053000, C355S071000

Reexamination Certificate

active

06846617

ABSTRACT:
One embodiment of the invention provides a system that uses pupil filtering to mitigate optical proximity effects that arise during an optical lithography process for manufacturing an integrated circuit. During operation, the system applies a photoresist layer to a wafer and then exposes the photoresist layer through a mask. During this exposure process, the system performs pupil filtering, wherein the pupil filtering corrects for optical proximity effects caused by an optical system used to expose the photoresist layer.

REFERENCES:
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5863712 (1999-01-01), Von Bunau et al.
patent: 20020001758 (2002-01-01), Petersen et al.
Sewell, II., et al., “Aberration Control for Advanced Step-and-Scan Systems Using Pupil Plane Engineering”, Optical Microlithography XIV Proceeding of SPIE, vol. 4346, pp. 585-594 (2001).
Publication entitled “Optimum combination of source, mask and filter for better lithographic performance,” by Hye-Keun Oh et al., SPIE Procedings, vol. 2440. pp. 838-849.
Book entitled “Introduction to Fourier Optics”, by Joseph W. Goodman. McGraw Hill. Boston, Massachusetts, pp. 150-155.

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