Faceplates having black matrix material

Details Faceplates having black matrix material Faceplates having black matrix material

1999-01-19

2000-05-30

Mayekar, Kishor

Chemistry: electrical and wave energy

Processes and products

Electrophoresis or electro-osmosis processes and electrolyte...

445 24, 445 52, 313496, 427 64, 427157, C25D 1302, H01J 1904

Patent

active

060687509

ABSTRACT:
A black matrix material for increasing resolution and contrast of field emission displays is disclosed. The black matrix material is preferably deposited by electrophoresis in the interstitial regions between phosphor pixels of the faceplate. By this technique, high resolution and/or small surface area field emission displays may be manufactured. The black matrix material does not brown when subjected to the conditions associated with the manufacture of field emission displays, is chemically inert and remains stable under vacuum conditions and electron bombardment. The black matrix material is selected from boron carbide, silicon carbide, tungsten carbide, vanadium carbide and mixtures thereof.

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