Fabrication technique for the production of devices which depend

Details Fabrication technique for the production of devices which depend Fabrication technique for the production of devices which depend

1981-07-22

1982-06-15

Weisstuch, Aaron

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156653, 156656, 156657, 204192E, 427131, C23F 102, G11C 1114

Patent

active

043349510

ABSTRACT:
Magnetic bubble devices having planar geometry are produced by a particular sequence of processing steps. This sequence of processing steps includes the sequential deposition on a garnet material of an insulating material, an electrically conductive material, a second insulating material, and a material such as permalloy. The upmost layer is then patterned by conventional techniques. The pattern thus produced is used as a mask and the exposed underlying insulating layer is removed. The exposed metal conducting layer is then patterned and etched in a pattern different from that of the permalloy and second insulating layers by a process such as selective plasma etching that does not substantially degrade the exposed dielectric material or the permalloy. The results are a device with layers having planar geometry.

REFERENCES:
patent: 3957552 (1976-05-01), Ahn et al.
patent: 4098917 (1978-07-01), Bullock et al.
patent: 4172758 (1979-10-01), Bailey et al.
patent: 4208241 (1980-06-01), Harshbarger et al.
patent: 4238277 (1980-12-01), Bril
patent: 4272348 (1981-06-01), Cox et al.
patent: 4299680 (1981-11-01), Fontana, Jr. et al.

Affiliated with

Also associated with

Rating

Fabrication technique for the production of devices which depend does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fabrication technique for the production of devices which depend, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication technique for the production of devices which depend will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1918044