Metal working – Barrier layer or semiconductor device making
Patent
1998-06-29
2000-08-08
Lund, Jeffrie R.
Metal working
Barrier layer or semiconductor device making
438694, 438689, 438758, 438908, 438514, 430313, 414217, 414222, 414278, 414935, 414937, 20429825, 118719, H01L 2100, B65G 4907, C23C 1400
Patent
active
06099598&
ABSTRACT:
Disclosed is a fabricating system including a plurality of processing apparatuses connected to each other by means of an inter-apparatus transporter, wherein one group of semiconductor wafers are processed in processing apparatuses and other group of wafers are transported to specified processing apparatuses for a time interval from (To+T) to a time To; and another group of wafers are processed and the remaining group of wafers are transported for a time interval from (To+T) to (To+2T). Since processing apparatuses can receive at least one of works from the inter-apparatus transporter for a time interval T min, the distribution of works from the transporter to processing apparatuses is completed for the time interval T min. The transporter is emptied for each time interval T min, and works are unloaded to the emptied transporter, which makes easy the scheduling, control and management of the transporting of a plurality of works in the fabricating system. Moreover, since the fabricating system including processing apparatuses is periodically controlled at a cycle time T min, the scheduling of a plurality of works can be made easy, to enhance the level of optimization, thus improving the productivity.
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Kawamoto Yoshifumi
Kawamura Yoshio
Mizuishi Kenichi
Murakami Eiichi
Uchida Fumihiko
Hitachi , Ltd.
Lund Jeffrie R.
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