Fabrication process of a semiconductor device including a...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S687000, C438S633000, C438S627000

Reexamination Certificate

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06893953

ABSTRACT:
A method for fabricating a semiconductor device includes the steps of forming a barrier conductor layer on a substrate, exposing the barrier conductor layer to a first reducing gas atmosphere at an elevated substrate temperature, forming a metal film on the barrier conductor layer by a CVD process, and exposing the metal film to a second gas atmosphere at an elevated substrate temperature.

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patent: 6475902 (2002-11-01), Hausmann et al.
patent: 6693030 (2004-02-01), Subrahmanyan et al.

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