Fabrication process for narrow groove

Details Fabrication process for narrow groove Fabrication process for narrow groove

1992-11-24

1994-07-12

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156656, 156657, 1566591, 156662, 437241, 437245, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

053285549

ABSTRACT:
In a process for producing a narrow groove in a layer of, for example, silicon nitride, a wide groove is first formed in the layer. A layer of a metal, for example aluminium, is evaporated on to one side of the wide groove. The remainder of the wide groove is then filled with a material such a silicon nitride. The metal layer is then etched away, leaving a narrow groove in the silicon nitride equal to the thickness of the metal layer.

REFERENCES:
patent: 4053349 (1977-10-01), Simko
patent: 4460434 (1984-07-01), Johnson et al.
patent: 4650544 (1987-03-01), Erb et al.

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