Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-01-14
1995-01-17
Breneman, R. Bruce
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419213, 20419215, 20419227, 20419228, 20419233, 20419234, C23C 1400
Patent
active
053823427
ABSTRACT:
A process for fabricating high efficiency x-ray lenses that operate in the 0.5-4.0 keV region suitable for use in biological imaging, surface science, and x-ray lithography of integrated circuits. The gradient index x-ray optics fabrication process broadly involves co-sputtering multi-layers of film on a wire, followed by slicing and mounting on block, and then ion beam thinning to a thickness determined by periodic testing for efficiency. The process enables the fabrication of transmissive gradient index x-ray optics for the 0.5-4.0 keV energy range. This process allows the fabrication of optical elements for the next generation of imaging and x-ray lithography instruments m the soft x-ray region.
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Bionta Richard M.
Makowiecki Daniel M.
Skulina Kenneth M.
Breneman R. Bruce
Gaither Roger S.
McDonald Rodney G.
Moser William R.
Sartorio Henry
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