Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1995-04-26
1997-02-25
Saadat, Mahshid D.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257304, 257305, 257349, 257350, 257401, H01L 27108, H01L 2701, H01L 2976
Patent
active
056061889
ABSTRACT:
An SOI DRAM includes a direct body contact between the SOI layer and the silicon substrate, and field-shield isolation positioned on the surface of the SOI structure which extends over the direct body contact. Deep trench storage capacitors are positioned adjacent the direct body contact.
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IBM Technical Disclosure Bulletin, "Method For Making a Dynamic Random-Access Memory Cell" vol. 32 No. 4A Sep. 1989.
Bronner Gary B.
DeBrosse John K.
Mandelman Jack A.
Clark Jhihan B.
International Business Machines - Corporation
Murray Susan M.
Saadat Mahshid D.
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