Fabrication of palladium anode for X-ray lithography

Details Fabrication of palladium anode for X-ray lithography Fabrication of palladium anode for X-ray lithography

1979-11-01

1982-03-16

Gantz, Delbert E.

Chemistry: electrical and wave energy

Processes and products

204 37R, 204 40, C25D 510, C25D 534, C25D 550

Patent

active

043199674

ABSTRACT:
A fabrication process for making palladium-plated target anodes for X-ray lithographic systems is characterized by a unique sequence of surface preparation, plating and annealing steps. Anodes made by the process have been operated reliably at high-power levels for extended periods of time.

REFERENCES:
patent: 3133005 (1964-05-01), Ades
patent: 3540988 (1970-11-01), Wells et al.
patent: 3947331 (1976-03-01), Kinh et al.
patent: 4088547 (1978-05-01), Albertson
Frederick Lowenheim, Electroplating, McGraw-Hill, New York, 1978, pp. 93-98.
Metal Finishing Guidebook and Directory 1978, Metals and Plastics Publications, Hackensack, N.J., pp. 18, 28-29.
J. B. Mohler, Finishing Pointer-Flash Plating, Metal Finishing, May 1979, p. 114.

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