Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1988-03-23
1989-10-24
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156651, 156653, 156656, 156657, 1566591, 357 71, 428209, 428446, 428622, 428633, 437 56, 437195, B44C 122, C23F 102, C03C 1500, H01L 21306
Patent
active
048759716
ABSTRACT:
A technique for production of customized integrated circuits comprising the steps of providing an integrated circuit blank having at least first and second metal layers including portions arranged for selectable removal to provide desired customization of said integrated circuit blank, and thereafter etching at least said first metal layer to customize said integrated circuit blank.
REFERENCES:
patent: 3731375 (1973-05-01), Agusta et al.
patent: 3740523 (1973-06-01), Cohen et al.
patent: 3769108 (1973-10-01), Feldman et al.
patent: 4124899 (1978-11-01), Birkner et al.
patent: 4197555 (1980-04-01), Uebara et al.
patent: 4217393 (1980-08-01), Staebler et al.
patent: 4233671 (1980-11-01), Gerzberg et al.
patent: 4238839 (1980-12-01), Redfern et al.
patent: 4240094 (1980-12-01), Mader
patent: 4259367 (1981-03-01), Dougherty, Jr.
patent: 4289846 (1981-09-01), Parks
patent: 4308090 (1981-12-01), Te Velde et al.
patent: 4321104 (1982-03-01), Hasegawa et al.
patent: 4325181 (1982-04-01), Yoder
patent: 4356504 (1982-10-01), Tozun
patent: 4387503 (1983-06-01), Aswell et al.
patent: 4389429 (1983-06-01), Soclof
patent: 4412237 (1983-10-01), Matsumura et al.
patent: 4450041 (1984-05-01), Aklufi
patent: 4455194 (1984-06-01), Yabu et al.
patent: 4455495 (1984-06-01), Masuhara et al.
patent: 4476478 (1984-10-01), Noguchi et al.
patent: 4520554 (1985-06-01), Fisher
patent: 4536249 (1985-08-01), Rhodes
patent: 4536949 (1985-08-01), Takayama et al.
patent: 4561906 (1985-12-01), Calder et al.
patent: 4581628 (1986-04-01), Miyauchi et al.
patent: 4585490 (1986-04-01), Raffel et al.
patent: 4590589 (1986-05-01), Gerzberg
patent: 4601778 (1986-07-01), Robb
patent: 4602420 (1986-07-01), Saito
patent: 4628590 (1986-12-01), Udo et al.
patent: 4632725 (1986-12-01), Hartmann et al.
patent: 4636404 (1987-01-01), Raffel et al.
patent: 4651190 (1987-03-01), Suzuki et al.
patent: 4665295 (1987-05-01), McDavid
patent: 4691434 (1987-09-01), Percival et al.
patent: 4692786 (1987-09-01), Lindenfelser
patent: 4700214 (1987-10-01), Johnson
patent: 4717689 (1988-01-01), Maas et al.
patent: 4718977 (1988-01-01), Contiero et al.
patent: 4720470 (1988-01-01), Johnson
patent: 4720908 (1988-01-01), Wills
patent: 4740485 (1988-04-01), Sharpe-Geisler
patent: 4751197 (1988-06-01), Wills
patent: 4758745 (1988-07-01), Elgamal et al.
patent: 4783424 (1988-11-01), Ohno et al.
patent: 4800179 (1989-01-01), Mukai
IBM Technical Disclosure Bulletin, Wet Etching for Line Deletion . . . , vol. 27, Mar. 1985.
D. Bursky, Semiconductor Technology, Electronic Design, No. 12, Jun. 1984.
Garrison et al., Laser Ablation of Organic Polymers, Journal of Applied Physics, No. 8, Apr. 1985.
M. J. Bowden, Forefront of Research on Resists, Solid State Technology, Jun. 1981.
I. Adesida, Ion Bombardment of Resists, Nuclear Instruments in Physics Research, vols. 209/210, May 1983, Part 1.
T. McGrath, Applications of Examiner Lasers in Microelectrics, Solid State Technology, No. 12, Dec. 1983.
J. J. Gadja et al., IBM Disclosure Bulletin, vol. 21, No. 12, May, 1979, Selective Conversion of Films . . . .
C. Fiori et al., High Resolution Ultraviolet Photoablation of SiOx Films, Applied Physics Letters, Aug. 1985, No. 4.
D. B. Tuckerman et al., Laser Planarization, Solid State Technology, Apr., 1986.
D. Smart, Optimization of Semiconductor Layer Thicknesses for Repair of RAMs.
B. C. Cole, Laser Micromachining Brings Quick Prototypes, Electronics, Nov. 12, 1987.
P. Martin et al., Observation of Exceptional Temperature Humidity Stability . . . , Applied Optics, vol. 23, No. 9, May, 1984.
S. K. Ghandi, VLSI Fabrication Principles, A Wiley Interscience Publication.
D. Platteter, Basic Integrated Circuit Failure Analysis Techniques.
J. Melngailis et al., The Focused Ion Beam as an Integrated . . . , J. Vac. Sci. Technol. B., vol. 4, No. 1, Jan./Feb. 1988.
J. Logue et al., Techniques for Improving Engineering Productivity . . . , IBM J. Res. Develop., vol. 25, No. 3, May 1981.
J. I. Raffel et al., Laser-Formed Connections Using Polyimide.
J. A. Yasaitis et al., Low Resistance Laser Formed Lateral Links, 1982, IEEE.
J. I. Raffel et al., A Demonstration of Very Large Area . . . , 1983 IEEE.
J. C. North et al., Laser Coding of Bipolar Read-Only Memories, IEEE Journal of Solid State Circuits, Aug. 1976.
J. C. North, Laser Vaporization of Metal Films . . . , J. of Applied Physics, vol. 48, No. 6, Jun. 1977.
J. I. Raffel et al., A Wafer-Scale Digital Integrator . . . , IEEE J. of Solid-State Circuits, vol. SC-20, No. 1, Feb. 1985.
S. Wolf et al., Silicon Processing for the VLSI Era, vol. 1, Process Technology.
M. Briska et al., Production and Application of Polysilicon Masks, IBM Technical Disclosure Bulletin, vol. 23, No. 1, Jun. 1980.
Lasers for Microelectronics, Florod Corporation.
Model 8000, Laser Programming System: The High Yield Solution.
Florod Lasers for Microelectronics, Advancing Laser Technology.
Computer Design, Mar. 1984.
R. L. Waters et al., A Laser Cutter for Failure Analysis, 1983 Proceedings of International Symposium for Testing & Failure Analysis.
S. Kazami et al., CMOS Gate-Array . . . , EDN, Oct. 31, 1984.
Technology Report, Laser Focus/Electro-Optics, Apr. 1984.
McWilliams et al., Appl. Phys. Lett., 43(10), Nov. 1983.
Industry News, Semiconductor International, Nov. 1983.
Janai Meir I.
Orbach Zvi
Elron Electronic Industries Ltd.
Powell William A.
LandOfFree
Fabrication of customized integrated circuits does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication of customized integrated circuits, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of customized integrated circuits will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1587048