Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2011-04-12
2011-04-12
Meeks, Timothy H (Department: 1715)
Coating processes
Coating by vapor, gas, or smoke
C428S317900, C428S615000
Reexamination Certificate
active
07923068
ABSTRACT:
Methods of constructing composite films including particles embedded in a filler matrix involve preparing a collection of stacked particles, then depositing a matrix material throughout the particle collection using an atomic layer deposition (ALD) method so as to substantially completely fill the spaces between the particles with the matrix material. During matrix deposition, a vapor phase etch cycle may be periodically employed to avoid clogging of small pores in the particle collection. New composite materials formed by such methods are also disclosed.
REFERENCES:
patent: 2356513 (1944-08-01), Gonon
patent: 3855638 (1974-12-01), Pilliar
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4556389 (1985-12-01), Ueno et al.
patent: 4652459 (1987-03-01), Engelhardt
patent: 4960646 (1990-10-01), Shimamune et al.
patent: 5076980 (1991-12-01), Nogues et al.
patent: 5082536 (1992-01-01), Izaki et al.
patent: 5178901 (1993-01-01), Toriyama et al.
patent: 5232570 (1993-08-01), Haines et al.
patent: 5650197 (1997-07-01), Halpern
patent: 5837331 (1998-11-01), Menu et al.
patent: 5853561 (1998-12-01), Banks
patent: 5952110 (1999-09-01), Schell et al.
patent: 6204971 (2001-03-01), Morris et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6261322 (2001-07-01), Despres, III et al.
patent: 6492014 (2002-12-01), Rolison et al.
patent: 6596375 (2003-07-01), Murata et al.
patent: 6749945 (2004-06-01), Knobbe et al.
patent: 6787199 (2004-09-01), Anpo et al.
patent: 6999669 (2006-02-01), Summers et al.
patent: 7141095 (2006-11-01), Aitchison et al.
patent: 7253104 (2007-08-01), Derderian et al.
patent: 2001/0034123 (2001-10-01), Jeon et al.
patent: 2002/0119662 (2002-08-01), Kobayashi
patent: 2004/0068323 (2004-04-01), Christensen
patent: 2004/0224087 (2004-11-01), Weimer et al.
patent: 2005/0031876 (2005-02-01), Lu et al.
patent: 2005/0118449 (2005-06-01), Derderian et al.
patent: 2005/0161120 (2005-07-01), Inagaki et al.
patent: 2005/0221072 (2005-10-01), Dubrow et al.
patent: 2005/0224779 (2005-10-01), Wang et al.
patent: 2006/0151803 (2006-07-01), Wesner et al.
patent: 2008/0160193 (2008-07-01), Mitchell
patent: 1020040107536 (2004-12-01), None
patent: WO 02/076631 (2002-10-01), None
patent: WO 2005/0258353 (2005-03-01), None
International Search Report and Written Opinion, PCT/US2008/053579, Jun. 9, 2008.
Kukli, Kaupo et al., Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor, Chem. Mater. 2001, v. 13, pp. 122-128, ACS, abstract only.
Snyder, Mark Q., Modification of Semi-Metal Oxide and Metal Oxide Powders by Atomic Layer Deposition of Thin Films, University of Maine, May 2007, 119 pages.
Haukka, Suvi, ALD Technology—Present and Future Challenges, ECS Transactions, 2007, v. 3(15), pp. 15-26, The Electrochemical Society.
Buechler, Karen, et al, Atomic Layer Deposition, an Enabling Coating Technology for the Nanotechnology Future, ALD NanoSolutions, Inc., Feb. 2004, http://www.aldnanosolutions.com/wp-content/uploads/2009/12/ALD—Technology—White—Paper.pdf, 5 pages.
Wikipedia, Adsorption, http://en.wikipedia.org/wiki/Adsorption, downloaded Oct. 18, 2010, 11 pages.
Elam, Jeffrey W. et al., Atomic Layer Deposition for the Conformal Coating of Nanoporous Materials, Journal of Nanomaterials, vol. 2006, Article ID 64501, May 2006, pp. 1-5.
Graugnard, E. et al., Atomic Layer Deposition for Photonic Crystal Devices, Georgia Institute of Technology, Aug. 16, 2004, 23 pages.
Graugnard, E. et al., Atomic Layer Deposition for Precise, Large-Scale Nanostructure Fabrication, Georgia Institute of Technology, Nov. 10, 2004, 31 pages.
Graugnard, E. et al., Photonic Band Tuning in Two-Dimensional Phonotic Crystal Slab Waveguides by Atomic Layer Deposition, Applied Physics Letters, v. 89, 181108, Oct. 31, 2006, 3 pages.
Graugnard, Elton et al., Sacrificial-Layer Atomic Layer Deposition for Fabrication of Non-Close-Packed Inverse-Opal Photonic Crystals, Advanced Functional Materials, v. 16, 2006, pp. 1187-1196.
King, J. S. et al., High-filling-fraction Inverted ZnS Opals Fabricated by Atomic Layer Deposition, Applied Physics Letters, vol. 83, No. 13, Sep. 29, 2003, pp. 2566-2568.
King, J. S. et al., Atomic Layer Deposition in Porous Structures: 3D Photonic Crystals, Applied Surface Science, v. 244, Jan. 19, 2005, pp. 511-516.
King, Jeffrey S. et al., Conformally Back-Filled, Non-close-packed Inverse-Opal Photonic Crystals, Advanced Materials, v. 18, Mar. 22, 2006, pp. 1063-1067.
King, Jeffrey S. et al., Infiltration and Inversion of Holographically Defined Polymer Photonic Crystal Templates by Atomic Layer Deposition, Advanced Materials, v. 18, May 18, 2006, pp. 1561-1565.
Ritala, Mikko et al., Atomic Layer Epitaxy—a Valuable Tool for Nanotechnology?, Nanotechnology 10, 1999, pp. 19-24.
Rugge, Alessandro et al., Tungsten Nitride Inverse Opals by Atomic Layer Deposition, Nano Letters, 2003, vol. 3, No. 9, Jul. 31, 2003, pp. 1293-1297.
Sneh, Ofer et al., Using Atomic Layer Deposition to Engineer Composite High-K Dielectric Films for Optimal Performance in Next Generations Semiconductor Devices, ICMI 2001 proceedings, 4 pages.
Barrow William A.
Dickey Eric R.
Lotus Applied Technology, LLC
Meeks Timothy H
Miller, Jr. Joseph
Stoel Rives LLP
LandOfFree
Fabrication of composite materials using atomic layer... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Fabrication of composite materials using atomic layer..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fabrication of composite materials using atomic layer... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2725055