Fabrication methods of thin film transistor substrates

Details Fabrication methods of thin film transistor substrates Fabrication methods of thin film transistor substrates

2007-10-09

2010-06-08

Nguyen, Ha Tran T (Department: 2829)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S149000, C438S940000, C257SE21414, C257S060000, C257SE51005, C257SE29151, C257SE29294

Reexamination Certificate

active

07732264

ABSTRACT:
Methods for manufacturing thin film transistor arrays utilizing three steps of lithography and one step of laser ablation while the lithography procedure is used four to five times in conventional processes are disclosed. The use of the disclosed methods assists in improving throughput and saving of manufacturing cost.

REFERENCES:
patent: 2005/0041166 (2005-02-01), Yamazaki et al.
patent: 2007/0269937 (2007-11-01), Lin

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