Fabrication method for sub-micron trench

Details Fabrication method for sub-micron trench Fabrication method for sub-micron trench

1986-08-15

1988-04-05

Schor, Kenneth M.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156644, 156653, 156662, B44C 122, C03C 1500

Patent

active

047356812

ABSTRACT:
A method for the construction of self aligned submicron trenches by forming projecting ridges on a surface, forming a mask over the surface and then etching back the ridges to form gaps in the mask which act as guides for the etching of trenches in the substrate below.

REFERENCES:
patent: 3965278 (1976-06-01), Duinker et al.
patent: 4449287 (1984-05-01), Maas et al.
patent: 4643798 (1987-02-01), Takada et al.
patent: 4645563 (1987-02-01), Terada
patent: 4648937 (1987-03-01), Ogura et al.

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