Fabrication method for digital micro-mirror devices using low te

Details Fabrication method for digital micro-mirror devices using low te Fabrication method for digital micro-mirror devices using low te

1994-09-30

1996-06-18

Bowers, Jr., Charles L.

Etching a substrate: processes

Forming or treating optical article

216 39, 430321, 427162, C23C 1612

Patent

active

055269516

ABSTRACT:
An improved support post (16, 23) for micro-mechanical devices (10). A conductive layer (33, 71) is deposited on a substrate at all places where the support posts (16, 23) are to be located. A spacer layer (41, 81) is then deposited and etched to form vias (41a, 81a). Each via (41a, 81a) defines the outer surface of a support post (16, 23). The bottom surface of each via is at the conductive layer (33, 71). This permits an aluminum CVD process to selectively fill the vias (41a, 81a), thereby forming the support posts (16, 23).

REFERENCES:
patent: 4956610 (1990-09-01), Galm et al.
patent: 5083857 (1992-01-01), Hornbeck
patent: 5149673 (1992-09-01), MacDonald et al.

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