Fabrication method for device structure having transparent...

Details Fabrication method for device structure having transparent... Fabrication method for device structure having transparent...

2010-05-13

2011-12-13

Wilson, Allan R (Department: 2815)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

On insulating substrate or layer

C257SE21462

Reexamination Certificate

active

08076220

ABSTRACT:
A semiconductor device has a transparent dielectric substrate such as a sapphire substrate. To enable fabrication equipment to detect the presence of the substrate optically, the back surface of the substrate is coated with a triple-layer light-reflecting film, preferably a film in which a silicon oxide or silicon nitride layer is sandwiched between polycrystalline silicon layers. This structure provides high reflectance with a combined film thickness of less than half a micrometer.

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