Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-11-21
1981-04-14
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
204158HE, 204158HA, 20415916, 20415917, 2041592, 20415922, 427 35, 427 36, 427 431, 427 44, 427 541, 430275, 430296, 430313, 430318, 430323, 430942, 430967, 430966, 526293, G03C 168, G03C 500
Patent
active
042620813
ABSTRACT:
Radiation sensitive negative resists with requisite stability for dry processing of integrated circuits are polymerized from aromatic moieties containing halogen atoms. Halogen-aryl bridging, generally carbonaceous, increases sensitivity to radiation. Exemplary materials, copolymers prepared from aromatic and glycidyl methacrylate (GMA) comonomers, are suitable for direct processing of large-scale integrated circuits. While electron beam patterning is contemplated both for direct processing and mask making, radiation such as X-ray and deep u.v. may be used.
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Bowden Murrae J. S.
Feit Eugene D.
Thompson Larry F.
Wilkins, Jr. Cletus W.
Bell Telephone Laboratories Incorporated
Indig George S.
Kimlin Edward C.
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