Fabricating lens array structures for imaging devices

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

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156643, 437228, G03F 726

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active

053842316

ABSTRACT:
A method of forming a planarized layer on a CCD device to permit a lens array to be formed which includes etching a B.sub.2 O.sub.3 layer provided on a conformally coated SiO.sub.2 layer until a sufficient amount of the deposited B.sub.2 O.sub.3 layer is removed to provide a planarized surface.

REFERENCES:
patent: 4966831 (1990-10-01), Mehra et al.
patent: 5204288 (1993-04-01), Marks et al.
Marks et al, In Situ Planarization of Dielectric Surfaces Using Boron Oxide, 1989 6th International IEEE VLSI Multilevel Interconnection Conference, vol. 1, No. 1, Jun. 1989.

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