Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2009-12-11
2011-11-01
Rosasco, Stephen (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
08048595
ABSTRACT:
A method of manufacturing a photomask includes forming an upper layer on a photomask substrate, and patterning the upper layer to form an upper pattern having an inclined sidewall, wherein patterning the upper layer includes anisotropically etching the upper layer using charged particles moving in parallel to a first direction inclined toward a top surface of the upper layer.
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Sugawara, Minoru, et al., “Effect of incident angle of off-axis illumination on pattern printability in extreme ultraviolet lithography”, J. Vac. Sci. Technol. B21(6), pp. 2701-2705 (Nov./Dec. 2003).
Huh Sung-min
Jang Il-yong
Woo Sang-Gyun
Lee & Morse P.C.
Rosasco Stephen
Samsung Electronics Co,. Ltd.
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