Radiant energy – Radiant energy generation and sources – With radiation modifying member
Reexamination Certificate
2008-05-06
2008-05-06
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Radiant energy generation and sources
With radiation modifying member
C250S493100, C378S119000
Reexamination Certificate
active
11107535
ABSTRACT:
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
REFERENCES:
patent: 2759106 (1956-08-01), Wolter
patent: 3150483 (1964-09-01), Mayfield et al.
patent: 3232046 (1966-02-01), Meyer
patent: 3279176 (1966-10-01), Boden
patent: 3746870 (1973-07-01), Demarest
patent: 3960473 (1976-06-01), Harris
patent: 3961197 (1976-06-01), Dawson
patent: 3969628 (1976-07-01), Roberts et al.
patent: 4042848 (1977-08-01), Lee
patent: 4088966 (1978-05-01), Samis
patent: 4143275 (1979-03-01), Mallozzi et al.
patent: 4162160 (1979-07-01), Witter
patent: 4203393 (1980-05-01), Giardini
patent: 4364342 (1982-12-01), Asik
patent: 4369758 (1983-01-01), Endo
patent: 4504964 (1985-03-01), Cartz et al.
patent: 4507588 (1985-03-01), Asmussen et al.
patent: 4536884 (1985-08-01), Weiss et al.
patent: 4538291 (1985-08-01), Iwamatsu
patent: 4561406 (1985-12-01), Ward
patent: 4596030 (1986-06-01), Herziger et al.
patent: 4618971 (1986-10-01), Weiss et al.
patent: 4626193 (1986-12-01), Gann
patent: 4633492 (1986-12-01), Weiss et al.
patent: 4635282 (1987-01-01), Okada et al.
patent: 4751723 (1988-06-01), Gupta et al.
patent: 4752946 (1988-06-01), Gupta et al.
patent: 4774914 (1988-10-01), Ward
patent: 4837794 (1989-06-01), Riordan et al.
patent: 4928020 (1990-05-01), Birx et al.
patent: 5023897 (1991-06-01), Neff et al.
patent: 5027076 (1991-06-01), Horsley et al.
patent: 5102776 (1992-04-01), Hammer et al.
patent: 5126638 (1992-06-01), Dethlefsen
patent: 5142166 (1992-08-01), Birx
patent: 5175755 (1992-12-01), Kumakhov
patent: 5313481 (1994-05-01), Cook et al.
patent: 5411224 (1995-05-01), Dearman et al.
patent: 5448580 (1995-09-01), Birx et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5729562 (1998-03-01), Birx et al.
patent: 5763930 (1998-06-01), Partlo
patent: 5866871 (1999-02-01), Birx
patent: 5936988 (1999-08-01), Partlo et al.
patent: 5963616 (1999-10-01), Silfvast et al.
patent: 6031241 (2000-02-01), Silfvast et al.
patent: 6039850 (2000-03-01), Schulz
patent: 6051841 (2000-04-01), Partlo
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6172324 (2001-01-01), Birx
patent: 6195272 (2001-02-01), Pascente
patent: 6566667 (2003-05-01), Partlo et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6586757 (2003-07-01), Melnychuk et al.
patent: 6972421 (2005-12-01), Melnychuk et al.
patent: 2001/0055364 (2001-12-01), Kandaka et al.
patent: 2002/0100882 (2002-08-01), Partlo et al.
patent: 2002/0168049 (2002-11-01), Schriever et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
Apruzese, J.P., “X-Ray Laser Research Using Z Pinches,”Am. Inst. of Phys.399-403, (1994).
Bollanti, et al., “Compact Three Electrodes Excimer Laser IANUS for a POPA Optical System,”SPIE Proc.(2206)144-153, (1994).
Bollanti, et al., “Ianus, the three-electrode excimer laser,”App. Phys. B(Lasers&Optics) 66(4):401-406, (1998).
Choi, et al., “A 1013A/s High Energy Density Micro Discharge Radiation Source,”B. Radiation Characteristics,p. 287-290.
Choi, et al., “Fast pulsed hollow cathode capillary discharge device,”Rev. of Sci. Instrum.69(9):3118-3122 (1998).
Choi et al., “Temporal development of hard and soft x-ray emission from a gas-puff Z pinch,” Rev. Sci. Instrum. 57(8), pp. 2162-2164 (Aug. 1986).
Fomenkov, et al., “Characterization of a 13.5nm Source for EUV Lithography based on a Dense Plasma Focus and Lithium Emission,” Sematech Intl. Workshop on EUV Lithography (Oct. 1999).
Giordano and Letardi, “Magnetic pulse compressor for prepulse discharge in spiker-sustainer excitati technique for XeCl lasers,” Rev. Sci. Instrum 65(8), pp. 2475-2481 (Aug. 1994).
Hansson, et al., “Xenon liquid jet laser-plasma source for EUV lithography,” Emerging Lithographic Technologies IV,Proc. Of SPIE, vol. 3997:729-732 (2000).
Jahn, Physics of Electric Propulsion, McGraw-Hill Book Company, (Series in Missile and Space U.S.A.), Chap. 9, “Unsteady Electromagnetic Acceleration,” p. 257 (1968).
Kato, Yasuo, “Electrode Lifetimes in a Plasma Focus Soft X-Ray Source,”J. Appl. Phys.(33) Pt. 1, No. 8:4742-4744 (1991).
Kato, et al., “Plasma focus x-ray source for lithography,”Am. Vac. Sci. Tech. B.,6(1): 195-198 (1988).
Lebert et al., “Comparison of laser produced and gas discharge based EUV sources for different applications,”International Conference Micro- and Nano-Engineering 98,Sep. 22-24, 1998, Leuven, Belgium, 6 pages.
Lebert, et al., “Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target,”J. Appl. Phys.,84(6):3419-3421 (1998).
Lebert, et al., “A gas discharge based radiation source for EUV-lithography,” Intl. Conf. Micro and Nano-Engineering 98 (Sep. 2-24, 1998) Leuven, Belgium.
Lebert, et al., “Investigation of pinch plasmas with plasma parameters promising ASE,” Inst. Phys. Conf. Ser No. 125: Section 9, pp. 411-415 (1992) Schiersee, Germany.
Lee, Ja H., “Production of dense plasmas in hypocyloidal pinch apparatus,”The Phys. Of Fluids,20(2):313-321 (1977).
Lewis, Ciaran L.S., “Status of Collision-Pumped X-ray Lasers,”Am Inst. Phys.pp. 9-16 (1994).
Lowe, “Gas plasmas yield X rays for Lithography,” Electronics, pp. 40-41 (Jan. 27, 1982).
Malmqvist, et al., “Liquid-jet target for laser-plasma soft x-ray generation,”Am. Inst. Phys.67(12):4150-4153 1996).
Mather, “Formation of a High-Density Deuterium Plasma Focus,” The Physics of Fluids, 8(2), 366-377 (Feb. 1965).
Mather, et al., “Stability of the Dense Plasma Focus,”Phys. Of Fluids,12(11):2343-2347 (1969).
Matthews and Cooper, “Plasma sources for x-ray lithography,” SPIE, 333, Submicron Lithography, pp. 136-139 (1982).
Mayo, et al., “A magnetized coaxial source facility for the generation of energetic plasma flows,”Sci. Technol.vol. 4:pp. 47-55 (1994).
Mayo, et al., “Initial Results on high enthalpy plasma generation in a magnetized coaxial source,”Fusion Techvol. 26:1221-1225 (1994).
Nilsen, et al., “Analysis of resonantly photopumped Na—Ne x-ray-laser scheme, ”Am Phys. Soc.44(7):4591-4597 (1991).
Partlo, et al., “EUV (13.5nm) Light Generation Using a Dense Plasma Focus Device,”SPIE Proc. On Emerging Lithographic Technologies III,vol. 3676, 846-858 (Mar. 1999).
Pearlman and Riordan, “X-ray lithography using a pulsed plasma source,” J. Vac. Sci. Technol,. pp. 1190-1193 (Nov./Dec. 1981).
Porter, et al., “Demonstration of Population Inversion by Resonant Photopumping in a Neon Gas Cell Irradiated by a Sodium Z Pinch,”Phys. Rev. Let.,68(6):796-799, (Feb. 1992).
Price, Robert H., “X-Ray Microscopy using Grazing Incidence Reflection Optics,”Am. Inst. Phys., pp. 189-199, (1981).
Qi, et al., “Fluorescence in Mg IX emission at 48.340 Å from Mg pinch plasmas photopumped by Al XI line radiation at 48.338 Å,”The Am. Phys. Soc.,47(3):2253-2263 (Mar. 1993).
Scheuer, et al., “A Magnetically-Nozzled, Quasi-Steady, Multimegawatt, Coaxial Plasma Thruster,”IEEE: Transactions on Plasma Science,22(6) (Dec. 1994).
Schriever, et al., “Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron sp
Blumenstock Gerry M.
Bowering Norbert R.
Dyer Timothy S.
Fomenkov Igor V.
Hoffman Jerzy R.
Cray William
Cymer Inc.
Nguyen Kiet T.
LandOfFree
Extreme ultraviolet light source does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Extreme ultraviolet light source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Extreme ultraviolet light source will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3911764