Extreme ultraviolet (EUV) lithography masks

Details Extreme ultraviolet (EUV) lithography masks Extreme ultraviolet (EUV) lithography masks

2006-01-10

2006-01-10

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06984475

ABSTRACT:
An extreme ultraviolet (EUV) lithography mask blank. The mask blank can include a substrate having a reflector film disposed over an upper surface of the substrate. The mask blank is provided with structural features to facilitate indirect grounding of the reflector film.

REFERENCES:
patent: 6893780 (2005-05-01), Galan et al.

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